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| Patents: DE10355264A1, DE10340436A1,
US020050114823A1 |
Optimization Tool Development for Lithographic Imaging
Master of Science Thesis in Intelligent Systems Design
Göteborg, Sweden 2004 |
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Resist Modeling and Parameter
Optimization for Microlithography Resists
Bachelor of Science Thesis in Microelectronics
Dresden, Germany 2003 |
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Will Darwin’s Law Help us to Improve our Resist Models?
SPIE 5039-33
Authors: Bernd Tollkühn, Tim Fühner , Daniela Matiut, Andreas Erdmann,
Armin Semmler, Bernd Küchler, Gabriella Kókai
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Methodology and practical application of an ArF resist model
calibration
SPIE 5376-129
Authors: Ralf Ziebold, Bernd Küchler, Christoph Nölscher, Martin
Rößiger
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